Browsing by Author "Grötzschel, R."

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Millisecond flash lamp annealing of shallow implanted layers in Ge

Wündisch, C.
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Posselt, M.
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Schmidt, B.
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Heera, V.
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Schumann, T.
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Mücklich, A.
;
Grötzschel, R.
Journal article
2009, Applied Physics Letters, (95) 25, p.252107
n+ doping of Ge by P or As implantation and flash-lamp annealing

Wündisch, C.
;
Posselt, M.
;
Anwand, W.
;
Schmidt, B.
;
Grötzschel, R.
;
Mücklich, A.
;
Skorupa, W.
Meeting abstract
2008, E-MRS Spring Meeting Symposium I: Front-End Junction and Contact Formation in Future Silicon/Germanium Based Devices, 26/05/2008