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    Atomic layer deposition of HfO2 on (100) and (110) oriented silicon surfaces

    Nyns, Laura  
    ;
    Ragnarsson, Lars-Ake  
    ;
    Hall, Lindsey
    ;
    Delabie, Annelies  
    ;
    Heyns, Marc  
    Proceedings paper
    2007, Physics and Technology of High-K Dielectrics, 7/10/2007, p.73-77

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