Browsing by Author "Hartmann, Hans"

Now showing 1 - 3 of 3

Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

Hourd, Andrew C.
;
Grimshaw, Anthony
;
Scheuring, Gerd
;
Gittinger, Christian
;
Brück, Hans-Jürgen
Proceedings paper
2002, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 14/01/2002, p.168-174
Implementation of 248nm based CD metrology for advanced reticle production

Hourd, Andrew
;
Grimshaw, Anthony
;
Scheuring, Gerd
;
Gittinger, Christian
;
Doebereiner, Stefan
Proceedings paper
2003-01, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 13/01/2003, p.148-157
Reliable sub-nanometer repeatability for CD metrology in a reticle production environment

Hourd, Andrew
;
Grimshaw, Anthony
;
Scheuring, Gerd
;
Gittinger, Christian
;
Döbereiner, Stefan
Proceedings paper
2002-12, 22nd Annual BACUS Symposium on Photomask Technology, 3/10/2002, p.319-342