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Reliable sub-nanometer repeatability for CD metrology in a reticle production environment
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Reliable sub-nanometer repeatability for CD metrology in a reticle production environment
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Date
2002-12
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hourd, Andrew
;
Grimshaw, Anthony
;
Scheuring, Gerd
;
Gittinger, Christian
;
Döbereiner, Stefan
;
Hillmann, Frank
;
Brück, Hans-Jürgen
;
Chen, Shiuh-Bin
;
Chen, Parkson
;
Jonckheere, Rik
;
Philipsen, Vicky
;
Hartmann, Hans
;
Ordynskyy, Vladimir
;
Peter, Kai
;
Schätz, Thomas
;
Sommer, Karl
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1850
since deposited on 2021-10-14
Acq. date: 2025-12-15
Citations
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Views
1850
since deposited on 2021-10-14
Acq. date: 2025-12-15
Citations