Browsing by Author "Hasegawa, Norio"
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Publication A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72722EPublication Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Publication Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Publication MuGFET Observation and CD measurement by using CD-SEM
Publication Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography
Publication Verification and extension of the MBL technique for photoresist pattern shape measurement