Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Publication:
Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Date
2008
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
16136.pdf
2.34 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Osaki, Mayuka
;
Tanaka, Maki
;
Shishido, Chie
;
Ishimoto, Toru
;
Hasegawa, Norio
;
Sekiguchi, Kohei
;
Watanabe, Kenji
;
Cheng, Shaunee
;
Laidler, David
;
Ercken, Monique
;
Altamirano Sanchez, Efrain
Journal
Abstract
Description
Metrics
Views
1942
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1942
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations