Publication:

Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography

Date

2008
Proceedings Paper
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dc.contributor.authorOsaki, Mayuka
dc.contributor.authorTanaka, Maki
dc.contributor.authorShishido, Chie
dc.contributor.authorIshimoto, Toru
dc.contributor.authorHasegawa, Norio
dc.contributor.authorSekiguchi, Kohei
dc.contributor.authorWatanabe, Kenji
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLaidler, David
dc.contributor.authorErcken, Monique
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.accessioned2021-10-17T09:31:49Z
dc.date.available2021-10-17T09:31:49Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14257
dc.source.beginpage69221B
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXII
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography

dc.typeProceedings paper
dspace.entity.typePublication
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