Browsing by Author "Haug, Rainer"
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Publication Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor
Proceedings paper2000, Cleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium, 17/10/1999, p.204-11Publication Application of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processor
Meeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1127