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Conference contributions
Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor
Publication:
Application of moist ozone gas phase for removal of resist and organic contamination in a novel tank type processor
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Date
2000
Proceedings Paper
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4959.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wolke, K.
;
Riedel, T.
;
Haug, Rainer
;
De Gendt, Stefan
;
Heyns, Marc
;
Meuris, Marc
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1896
since deposited on 2021-10-14
Acq. date: 2026-01-09
Citations
Metrics
Views
1896
since deposited on 2021-10-14
Acq. date: 2026-01-09
Citations