Browsing by Author "Hellstrom, P.E."

Now showing 1 - 3 of 3

Reduced self-heating by strained silicon substrate engineering

O'Neill, A.
;
Olsen, S.
;
Yang, Y.
;
Agaiby, R.
;
Hellstrom, P.E.
;
Ostling, M.
;
Lyutovich, K.
;
Kasper, E.
Meeting abstract
2007, 5th International Symposium on Control of Semiconductor Interfaces - ISCSI-V, 12/11/2007
Strain engineering for high mobility channels

Olsen, S.
;
Al Tarawneh, Z.
;
Varzgar, J,
;
Escobedo-Cousin, E.
;
Agaiby, R.
;
Dobrosz, P.
;
O'Neill, A.
Oral presentation
2008, International Conference on Semiconductor Technology
Strained Si/SiGe MOS technology: improving gate dielectric integrity

Olsen, S.H.
;
Yan, L.
;
Agaiby, R.
;
Escobedo-Cousin, A.G.
;
O'Neil, A.G.
;
Hellstrom, P.E.
;
Ostling, M.
Journal article
2009, Microelectronic Engineering, (86) 3, p.218-223