Publication:

Strained Si/SiGe MOS technology: improving gate dielectric integrity

Date

2009

Journal article

Simple item page Full metadata Statistics

Files

18906.pdf 514 KB

Author(s)

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Escobedo-Cousin, A.G.

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Hellstrom, P.E.

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Journal

Microelectronic Engineering

Metrics

1954 since deposited on 2021-10-18

Acq. date: 2025-12-09