Publication:

Strained Si/SiGe MOS technology: improving gate dielectric integrity

Date

2009
Journal article
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Author(s)

Olsen, S.H.
;
Yan, L.
;
Agaiby, R.
;
Escobedo-Cousin, A.G.
;
O'Neil, A.G.
;
Hellstrom, P.E.
;
Ostling, M.
;
Lyutovich, K.
;
Kasper, E.
;
Claeys, Cor
;
Parker, E.H.C.

Journal

Microelectronic Engineering

Abstract

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