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Browsing by Author "Hennerkes, Christoph"

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    Freeform illumination sources: Source mask optimization for 22 nm node SRAM

    Bekaert, Joost  
    ;
    Laenens, Bart
    ;
    Verhaegen, Staf
    ;
    Van Look, Lieve  
    ;
    Trivkovic, Darko  
    Proceedings paper
    2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009
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    Mask Contribution to OPC Model Accuracy

    Lyons, Adam
    ;
    Wallow, Tom
    ;
    Hennerkes, Christoph
    ;
    Spence, Chris
    ;
    Delorme, Max  
    ;
    Rio, David  
    Proceedings paper
    2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020, p.115171D

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