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Mask Contribution to OPC Model Accuracy
Publication:
Mask Contribution to OPC Model Accuracy
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Date
2020
Proceedings Paper
https://doi.org/10.1117/12.2573160
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lyons, Adam
;
Wallow, Tom
;
Hennerkes, Christoph
;
Spence, Chris
;
Delorme, Max
;
Rio, David
;
Tsunoda, Dai
;
Torigoe, Yohei
;
Hamaji, Masakazu
Journal
Proceedings of SPIE
Abstract
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1842
since deposited on 2021-11-02
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last month
Acq. date: 2025-12-11
Citations
Metrics
Views
1842
since deposited on 2021-11-02
3
last month
Acq. date: 2025-12-11
Citations