Browsing by Author "Hillman, Frank"
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Publication Implementation of 248nm based CD metrology for advanced reticle production
Publication Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
Proceedings paper2003-01, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 13/01/2003, p.158-168