Publication:

Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment

Date

2003-01

Proceedings Paper

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Author(s)

Jonckheere, Rik

;

Philipsen, Vicky

;

Scheuring, Gerd

;

;

Brueck, Hans-Juergen

;

Ordynskyy, Volodymyr

;

;

;

Schaetz, Thomas

;

Chen, Shiuh-Bin

;

;

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