Browsing by Author "Hofmann, Thorsten"
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Publication Additional evidence of EUV blank defects first seen by wafer printing
Proceedings paper2011, Photomask Technology 2011, 19/09/2011, p.81660EPublication EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy
Publication Evidence of printing blank-related defects on EUV masks missed by blank inspection
Proceedings paper2011, 27th European Mask and Lithography Conference - EMLC, 18/01/2011, p.79850WPublication Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
Proceedings paper2011, Physical Optics, 5/09/2011, p.81710M