Browsing by Author "Hosokawa, Kohei"
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Publication Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication EUV resist material performance, progress and process improvements at imec
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication EUV resist performance update on ADT and NXE:3100 scanner
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication EUV resist process performance investigations on the NXE 3100 full field scanner
Journal article2012, Journal of Photopolymer Science and Technology, (25) 5, p.559-567Publication Recent advancements in EUV resist materials and process performance
Journal article2011, Journal of Photopolymer Science and Technology, (24) 1, p.25-31