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Browsing by Author "Hoyer, Ronald"

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    Acoustic cleaning in nano-electronics

    Mertens, Paul  
    ;
    Janssens, Tom
    ;
    Holsteyns, Frank  
    ;
    Zijlstra, Aaldert
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    Halder, Sandip  
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    Wostyn, Kurt  
    Proceedings paper
    2008, Acoustics, 29/06/2008, p.556-560
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    How much rear side polishing is required? A study on the impact of rear side polishing in PERC solar cells

    Cornagliotti, Emanuele  
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    Uruena De Castro, Angel
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    Horzel, Jörg
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    John, Joachim  
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    Tous, Loic  
    Proceedings paper
    2012, 27th European Photovoltaic Solar Energy Conference and Exhibition - EUPVSEC, 24/09/2012, p.561-566
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    Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutions

    Mertens, Paul  
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    Vos, Rita  
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    Vereecke, Guy  
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    Janssens, Tom
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    Wostyn, Kurt  
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    Claes, Martine  
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    Kesters, Els  
    Proceedings paper
    2008, 7th International Semiconductor Technology Conference - ISTC, 15/03/2008, p.436-446
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    Ultra low concentration clean: a new approach to feol critical wafer surface cleaning

    Fischer, Thomas
    ;
    Puri, Suraj
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    Hoyer, Ronald
    ;
    Wostyn, Kurt  
    ;
    Janssens, Tom
    Proceedings paper
    2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.167-174

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