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Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutions
Publication:
Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutions
Date
2008
Proceedings Paper
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17845.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mertens, Paul
;
Vos, Rita
;
Vereecke, Guy
;
Janssens, Tom
;
Wostyn, Kurt
;
Claes, Martine
;
Kesters, Els
;
Le, Quoc Toan
;
Halder, Sandip
;
Hoyer, Ronald
;
Andreas, Michael
;
Kim, Kyung Hyun
;
Barbagini, Francesca
;
Zijlstra, Aaldert
;
Holsteyns, Frank
;
Kim, Tae-Gon
;
Kenis, Karine
;
Arnauts, Sophia
;
Lux, Marcel
;
Bearda, Twan
;
Heyns, Marc
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2020
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
2020
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations