Browsing by Author "Hsu, S."
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Publication Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.764008Publication Gray bar masking: fabrication and imaging for 193 nm
Oral presentation2001, 21st Annual BACUS Symposium on Photomask Technology; October 2001; Monterey, CA, USA.Publication The magnitude of potential exposure-tool-induced critical dimension and overlay errors in double dipole lithography for the 65-nm and 45-nm technology nodes
Journal article2004, Japanese Journal of Applied Physics. Part 1: Regular Papers, (43) 6B, p.3672-3679