Browsing by Author "Izumi, A."
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Publication Application of single-wafer wet cleaning prior to epitaxial SiGe process
Journal article2009, Solid State Phenomena, 145-146, p.173-176Publication Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe
Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.243-246Publication Effect of chemical growth air filter for wafer storage before epitaxial growth
Proceedings paper2008, SEMATECH Meeting, 31/03/2008Publication Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer
Proceedings paper2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.53-56Publication Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface
Proceedings paper2005, Cleaning Technology in Semiconductor Device Manufacturing IX, 16/10/2005, p.134-141