Browsing by Author "Jen, Wei-Lun"
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Publication Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.72733GPublication Fluorinated polymethacrylates as highly sensitive nonchemically amplified e-beam resists
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.43011