Browsing by Author "Juffermans, C."
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Publication Impact of high order aberrations on the performance of the aberration monitor
Proceedings paper2000, Optical Microlithography XIII, 1/03/2000, p.9-17Publication New approach to optical proximity correction
;Rosenbusch, A. ;Hourd, A. ;Juffermans, C. ;Kirsch, H. ;Lalanne, F. ;Maurer, W. ;Romeo, C.Proceedings paper1998, 18th Annual Bacus Symposium on Photomask Technology and Management, 16/09/1998, p.585-593