Browsing by Author "Juncker, Aurelie"
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Publication A million wafer, virtual fabrication approach to determine process capability requirements for an industry-standard 5nm BEOL two-level metal flow
Proceedings paper2016, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 6/09/2016, p.43-46Publication Self-aligned block and fully self-aligned via for iN5 Metal 2 Self-aligned quadruple patterning
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.105830WPublication Self-aligned block and fully self-aligned via for iN5 metal 2 self-aligned quadruple patterning
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.105830WPublication Toward sub-20nm pitch Fin patterning and integration with DSA
Proceedings paper2016, Advances in Patterning Materials and Processes XXXIII, 22/02/2016, p.97790R