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Browsing by Author "Kasper, E."

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    Reduced self-heating by strained silicon substrate engineering

    O'Neill, A.
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    Olsen, S.
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    Yang, Y.
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    Agaiby, R.
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    Hellstrom, P.E
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    Ostling, M.
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    Lyutovich, K.
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    Kasper, E.
    Meeting abstract
    2007, 3rd International Workshop on New Group IV Semiconductor Nanoelectronics, 8/11/2007
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    Reduced self-heating by strained silicon substrate engineering

    O'Neill, Anthony
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    Agaiby, Rimoon
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    Olsen, Sarah
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    Yang, Y.
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    Hellstrom, P.-E.
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    Ostling, M.
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    Oehme, M.
    Journal article
    2008, Applied Surface Science, (254) 19, p.6182-6185
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    Reduced self-heating by strained silicon substrate engineering

    O'Neill, A.
    ;
    Olsen, S.
    ;
    Yang, Y.
    ;
    Agaiby, R.
    ;
    Hellstrom, P.E.
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    Ostling, M.
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    Lyutovich, K.
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    Kasper, E.
    Meeting abstract
    2007, 5th International Symposium on Control of Semiconductor Interfaces - ISCSI-V, 12/11/2007
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    Strained Si/SiGe MOS technology

    Olsen, S.
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    Yan, L.
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    Agaiby, R.
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    Escobedo-Cousin, E.
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    O'Neill, A.G.
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    Hellstrom, P.-E.
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    Ostling, M.
    Oral presentation
    2007, 4th International Symposium on Advanced Gate Stack technology
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    Strained Si/SiGe MOS technology: improving gate dielectric integrity

    Olsen, S.H.
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    Yan, L.
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    Agaiby, R.
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    Escobedo-Cousin, A.G.
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    O'Neil, A.G.
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    Hellstrom, P.E.
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    Ostling, M.
    Journal article
    2009, Microelectronic Engineering, (86) 3, p.218-223
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    Strained silicon SiGe HFETs for microwave applications

    König, U.
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    Herzog, H.-J.
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    Aniel, F.
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    Kasper, E.
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    De Meyer, Kristin  
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    Rabe, W.J.
    ;
    Schumacher, H.
    Oral presentation
    2003, 33rd European Microwave Conference (EuMC)

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