Browsing by Author "Kerr, Daniel"
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Publication 0.13µm CMOS technology with optimized poly-Si / NO-oxide gate stack
Proceedings paper1999, ULSI Process Integration. Proceedings of the First International Symposium, 17/10/1999, p.193-202Publication Gate stack optimisation for advanced CMOS process
Proceedings paper1999, ESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium., p.412-415Publication Investigation of instrinsic transistor performance of advanced CMOS devices with 2.5 nm NO gate oxides
Proceedings paper1999, International Electron Devices Meeting. Technical Digest; 5-8 Dec. 1999; Washington, D.C., USA., p.823-826