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Conference contributions
0.13µm CMOS technology with optimized poly-Si / NO-oxide gate stack
Publication:
0.13µm CMOS technology with optimized poly-Si / NO-oxide gate stack
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Date
1999
Proceedings Paper
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3540.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kubicek, Stefan
;
Jansen, Philippe
;
Badenes, Gonçal
;
Schaekers, Marc
;
Kol'dyaev, Victor
;
Deferm, Ludo
;
De Meyer, Kristin
;
Kerr, Daniel
;
Naem, Abdalla
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2
since deposited on 2021-10-06
Acq. date: 2025-12-24
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2453
since deposited on 2021-10-06
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last month
Acq. date: 2025-12-24
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Metrics
Downloads
2
since deposited on 2021-10-06
Acq. date: 2025-12-24
Views
2453
since deposited on 2021-10-06
3
last month
Acq. date: 2025-12-24
Citations