Browsing by Author "Kobayashi, N."
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Publication Integration of porogen-based low-k films: influence of capping layer thickness and long thermal anneals on low-k damage and reliability
Oral presentation2009, ADMETA 2009Publication Key factors to sustain the extension of a MHM-based integration scheme to medium and high porosity PECVD low-k materials
Proceedings paper2008, 11th IEEE International Interconnect Technology Conference - IITC, 1/06/2008, p.52-54Publication Variation in process conditions of porogen-based low-k films: a method to improve performance without changing existing process steps in a sub-100nm Cu damascene integration route
Meeting abstract2009, 18th Workshop Materials for Advanced Metallization - MAM, 8/03/2009