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Key factors to sustain the extension of a MHM-based integration scheme to medium and high porosity PECVD low-k materials
Publication:
Key factors to sustain the extension of a MHM-based integration scheme to medium and high porosity PECVD low-k materials
Date
2008
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Travaly, Youssef
;
Van Aelst, Joke
;
Truffert, Vincent
;
Verdonck, Patrick
;
Dupont, Tania
;
Camerotto, Elisabeth
;
Richard, Olivier
;
Bender, Hugo
;
Croes, Kristof
;
De Roest, David
;
Vereecke, Guy
;
Claes, Martine
;
Le, Quoc Toan
;
Kesters, Els
;
Van Cauwenberghe, Marc
;
Beynet, Julien
;
Kaneko, S.
;
Struyf, Herbert
;
Baklanov, Mikhaïl
;
Matsushita, K.
;
Kobayashi, N.
;
Sprey, Hessel
;
Beyer, Gerald
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1999
since deposited on 2021-10-17
Acq. date: 2025-10-24
Citations
Metrics
Views
1999
since deposited on 2021-10-17
Acq. date: 2025-10-24
Citations