Browsing by Author "Kohlpoth, Stephanie"
Now showing 1 - 2 of 2
- Results per page
- Sort Options
Publication Defect printability for 100-nm design rule using 193nm lithography
Proceedings paper2002, Photomask and Next-Generation Lithography Mask Technology IX, 23/04/2002, p.640-651Publication Printability of hard and soft defects in 193-nm lithography
Proceedings paper2002, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 14/01/2002, p.95-111