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Defect printability for 100-nm design rule using 193nm lithography
Publication:
Defect printability for 100-nm design rule using 193nm lithography
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Date
2002
Proceedings Paper
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6286.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Jonckheere, Rik
;
Kohlpoth, Stephanie
;
Torres, Andres
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1902
since deposited on 2021-10-14
Acq. date: 2025-12-11
Citations
Metrics
Views
1902
since deposited on 2021-10-14
Acq. date: 2025-12-11
Citations