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Browsing by Author "Kondo, Y."

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    EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

    Nagahara, S.
    ;
    Dinh, C.Q.
    ;
    Yoshida, Keisuke  
    ;
    Shiraishi, G.
    ;
    Kondo, Y.
    ;
    Yoshihara, K.
    Proceedings paper
    2020, Advances in Patterning Materials and Processes XXXVII, 24/02/2020, p.113260A

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