Browsing by Author "Krasnikov, G."
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Publication Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)
Journal article2015, Electronic Engineering, 3, p.49Publication Adsorption isobars of fluorocarbon compounds selected for cryogenic etching of low-k materials
Meeting abstract2015, Spring MRS Meeting Symposium BB: Innovative Interconnects/Electrodes for Advances Devices, Flexible and Green Energy Electronics, 6/04/2015, p.BB2.03Publication Effect of quartz window temperature on plasma composition during STI etch
Proceedings paper2008, Micro- and Nanoelectronics 2007, 1/10/2007, p.7.03E+03Publication Investigation of plasma damage of low-k dielectrics during cryogenic etching