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Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)
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Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)
Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Rezvanov, A.
;
Gutshin, O.
;
Gornev, E.
;
Krasnikov, G.
;
Mogil'nikov, K.
;
Zhang, Liping
;
de Marneffe, Jean-Francois
;
Dussarat, C.
;
Baklanov, Mikhaïl
Journal
Electronic Engineering
Abstract
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1918
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations
Metrics
Views
1918
since deposited on 2021-10-22
Acq. date: 2025-10-23
Citations