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Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)

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1921 since deposited on 2021-10-22
1last month
Acq. date: 2026-04-28

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1921 since deposited on 2021-10-22
1last month
Acq. date: 2026-04-28

Citations