Publication:
Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian)
Date
| dc.contributor.author | Rezvanov, A. | |
| dc.contributor.author | Gutshin, O. | |
| dc.contributor.author | Gornev, E. | |
| dc.contributor.author | Krasnikov, G. | |
| dc.contributor.author | Mogil'nikov, K. | |
| dc.contributor.author | Zhang, Liping | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Dussarat, C. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.imecauthor | Zhang, Liping | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.date.accessioned | 2021-10-22T22:13:23Z | |
| dc.date.available | 2021-10-22T22:13:23Z | |
| dc.date.issued | 2015 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25815 | |
| dc.source.beginpage | 49 | |
| dc.source.journal | Electronic Engineering | |
| dc.source.volume | 3 | |
| dc.title | Adsorption isobars of fluorocarbon compounds for cryogenic plasma etching of low-k dielectrics (in Russian) | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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