Browsing by Author "Kubis, Michael"
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Publication Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Proceedings paper2019, XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology 2019, 16/04/2019, p.1117807-1-1117807-7Publication Integrated approach to improving local CD uniformity in EUV patterning
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014319