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Browsing by Author "Laidig, Thomas L."

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    Double dipole lithography for 65-nm node and beyond: a technology readiness review

    Hsu, Stephen
    ;
    Eurlings, Mark
    ;
    Hendrickx, Eric  
    ;
    Van Den Broeke, Douglas J.
    ;
    Chiou, Tsann-Bim
    Proceedings paper
    2004-08, Photomask and Next-Generation Lithography Mask Technology XI, 14/04/2004, p.481-498

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