Browsing by Author "Leeson, Michael J."
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Publication Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
; Jack, Kevin S.Journal article2011, Journal of Materials Chemistry, (21) 15, p.5629-5637Publication Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942516Publication Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 3, p.33004Publication Impact of EUV mask surface roughness on LER
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83220N