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Browsing by Author "Lefaucheux, P"

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    Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas

    Leroy, F.
    ;
    Zhang, Liping  
    ;
    Tillocher, T.
    ;
    Yatsuda, K.
    ;
    Maekawa, K
    ;
    Nishimura, E
    ;
    Lefaucheux, P
    Journal article
    2015, Journal of Physics D: Applied Physics, (48) 43, p.435202

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