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Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas
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Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas
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Date
2015
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Leroy, F.
;
Zhang, Liping
;
Tillocher, T.
;
Yatsuda, K.
;
Maekawa, K
;
Nishimura, E
;
Lefaucheux, P
;
de Marneffe, Jean-Francois
;
Baklanov, Mikhaïl
;
Dussart, R
Journal
Journal of Physics D: Applied Physics
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1965
since deposited on 2021-10-22
Acq. date: 2025-12-11
Citations
Metrics
Views
1965
since deposited on 2021-10-22
Acq. date: 2025-12-11
Citations