Publication:
Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas
Date
| dc.contributor.author | Leroy, F. | |
| dc.contributor.author | Zhang, Liping | |
| dc.contributor.author | Tillocher, T. | |
| dc.contributor.author | Yatsuda, K. | |
| dc.contributor.author | Maekawa, K | |
| dc.contributor.author | Nishimura, E | |
| dc.contributor.author | Lefaucheux, P | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Dussart, R | |
| dc.contributor.imecauthor | Zhang, Liping | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.date.accessioned | 2021-10-22T20:26:25Z | |
| dc.date.available | 2021-10-22T20:26:25Z | |
| dc.date.issued | 2015 | |
| dc.identifier.issn | 0022-3727 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25531 | |
| dc.identifier.url | http://iopscience.iop.org/article/10.1088/0022-3727/48/43/435202;jsessionid=F796BFA7BEDDB443951586DEF11045CB.c1 | |
| dc.source.beginpage | 435202 | |
| dc.source.issue | 43 | |
| dc.source.journal | Journal of Physics D: Applied Physics | |
| dc.source.volume | 48 | |
| dc.title | Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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