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Browsing by Author "Leunissen, Leonardus"

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    An improved CMP process for integration of high mobility channel materials

    Teugels, Lieve  
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    Ong, Patrick  
    ;
    Ansar, Sheik
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    Delande, Tinne  
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    Bhonsle, Rithu
    ;
    Siebert, Max
    Meeting abstract
    2016, International Conference on Planarization Technology - ICPT, 17/10/2016
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    An improved CMP process for integration of high mobility channel materials

    Teugels, Lieve  
    ;
    Ong, Patrick  
    ;
    Usman Ibrahim, Ansar  
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    Delande, Tinne  
    ;
    Bhonsle, Rithu
    ;
    Siebert, Max
    Proceedings paper
    2016, Internation Conference on Planarization/CMP Technology - ICPT, 17/10/2016
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    Improving defectivity for III-V CMP processes for < 10 NM technology nodes

    Teugels, Lieve  
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    Ong, Patrick  
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    Waldron, Niamh  
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    Boccardi, Guillaume  
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    Usman Ibrahim, Ansar  
    Proceedings paper
    2014, International Conference on Planarization/CMP Technology - ICPT, 19/11/2014, p.15-17
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    Inspection, characterization and classification of defects for improved CMP of III-V materials

    Bhonsle, Rithu
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    Teugels, Lieve  
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    Usman Ibrahim, Ansar  
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    Ong, Patrick  
    ;
    Delande, Tinne  
    ;
    Krishnan, S
    Journal article
    2015, ECS Journal of Solid State Science and Technology, (4) 11, p.5073-5077
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    Inspection, characterization and classification of defects for improved CMP of III-V materials

    Bhonsle, Rithu
    ;
    Teugels, Lieve  
    ;
    Usman Ibrahim, Ansar  
    ;
    Ong, Patrick  
    ;
    Delande, Tinne  
    Proceedings paper
    2015, 34th CMP Users Meeting, 29/10/2015
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    Updates on Ge AND SiGe CMP processes for integration as high mobility channel materials

    Ong, Patrick  
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    Teugels, Lieve  
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    Ansar, Sheikh
    ;
    Delande, Tinne  
    ;
    Bhonsle, Rithu
    ;
    Siebert, Max
    Meeting abstract
    2015, International Conference on Planarization/CMP Technology - ICPT, 30/09/2015

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