Browsing by Author "Levinson, Zac"
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Publication A method of image-based aberration metrology for EUVL tools
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 23/02/2015, p.942215Publication Mitigating mask roughness via pupil filtering
Proceedings paper2014, Optical Microlithography XXVII, 23/02/2014, p.90521OPublication The impact of pupil plane filtering on mask roughness transfer
Journal article2013, Journal of Vacuum Science and Technology B, (31) 6, p.06F801