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    A finite element study of process induced stress in the transistor channel: effects of silicide contact and gate stack

    Torregiani, Cristina
    ;
    Liu, Joy
    ;
    Vandevelde, Bart  
    ;
    Degryse, Dominiek
    ;
    Van Dal, Mark  
    Proceedings paper
    2004, EuroSimE: 5th Int. Conf. on Thermal & Mechanical Simulation and Experiments in Micro-Electronics and Micro-Systems, 9/05/2004, p.61-68

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