Publication:
A finite element study of process induced stress in the transistor channel: effects of silicide contact and gate stack
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1921 since deposited on 2021-10-15
1last month
Acq. date: 2026-05-15
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Statistics
Views
1921 since deposited on 2021-10-15
1last month
Acq. date: 2026-05-15
Citations