Browsing by Author "Liubich, Vlad"
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Publication Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
;Sah, Kaushik ;Cross, Andrew; ; ; Kim, Ryan Ryoung hanProceedings paper2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022, p.Art. 122920W