Browsing by Author "Ljazouli, Rami"
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Publication Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4
Journal article2013, ECS Journal of Solid State Science and Technology, (2) 6, p.N131-N139Publication Study of damage caused by non-reactive Ar plasma on an organic low-k material
Meeting abstract2012, Plasma Etch and Strip in Microelectronics - PESM, 15/03/2012Publication Study of ion and VUV effects on self-assembled organic low-k material exposed to argon plasma
Meeting abstract2012, MRS Spring Meeting Symposium C: Interconnect Challenges for CMOS Technology, 9/04/2012, p.C2.9