Publication:

Low damage cryogenic etching of porous organosilicate low-k materials using SF6/O2/SiF4

Date

2013

Journal article

Simple item page Full metadata Statistics

Files

26788.pdf 1.77 MB

Author(s)

;

;

Lefaucheux, Philippe

;

Tillocher, Thomas

;

;

Mankelevich, Yuri

;

de Marneffe, Jean-Francois

;

De Gendt, Stefan

;

Baklanov, Mikhaïl

Journal

ECS Journal of Solid State Science and Technology

Statistics

1966 since deposited on 2021-10-21

Acq. date: 2026-01-25