Browsing by Author "Luk-Pat, Gerard"
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Publication Design compliance for Spacer Is Dielectric (SID) patterning
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83260DPublication Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
Publication Printability verification for double-patterning technology
Proceedings paper2008, Photomask Technology 2008, 6/10/2008, p.71220Q