Browsing by Author "Mülders, Thomas"

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Application of an inverse Mack model for negative tone development simulation

Gao, Weimin
;
Klostermann, Ulrich
;
Mülders, Thomas
;
Schmoeller, Thomas
;
Demmerle, Wolfgang
Proceedings paper
2011, Optical Microlithography XXIV, 27/02/2011, p.79732W
Calibration of physical resist models: methods, usability, and predictive power

Klostermann, Ulrich
;
Mülders, Thomas
;
Ponomarenco, Denis
;
Schmoeller, Thomas
Proceedings paper
2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727318
Post-dicing particle control for 3D stacked IC integration flows

Bearda, Twan
;
Travaly, Youssef
;
Wostyn, Kurt
;
Halder, Sandip
;
Swinnen, Bart
;
Mülders, Thomas
Proceedings paper
2009, 59th Electronic Components and Technology Conference - ECTC, 25/05/2009, p.1513-1516